Cadence CADENCE MASKCOMPOSE RETICLE AND WAFER SYNTHESIS SUITE Datasheet - page 2
2
www.cadence.com
CADENCE MASKCOMPOSE RETICLE AND WAFER SYNTHESIS SUITE
All MaskCompose modules are designed
to handle the general case and are
independent of process technologies or
stepper environments. This enables design
and manufacturing teams to handle the
equipment “mixing and matching” that
is common in today’s manufacturing
environments. It also serves to protect
the customer’s software investment as
technologies and manufacturing
requirements change. Information
generated by a module at runtime is used
where appropriate as input to other
modules, thus maintaining consistent
correlation across GDSII data, mebes data,
jobdecks, order forms, and paperwork.
The type of output data to be generated
is determined by the respective
definitions, and can include:
• GDSIIandOASISframes,which
conform to the requirements of the
selected fab and process technology
• Waferlayout“shot-maps”including
appropriate secondary fields
• Derivedlayerandfracturecommandfiles
• Mebesjobdecks
• Customizedmaskorderforms
• Customizedfabpaperwork
BENEFITS
• Providesahighlyefficientand
environment-independent design
tapeout system
• Adefinitionvs.implementationparadigm
allows users to take advantage of the
benefits of automation (productivity,
repeatability, fewer errors) while still
satisfying the unique requirements of
target process technologies and
manufacturing environments
• Simplifiessame-technologycell
qualification through easy incorporation
as optional test data into reticle designs
• Automaticpaperworkgeneration
boosts productivity and brings
repeatability and accuracy to a process
that is particularly error-prone when
handled manually
• Jobdeckgenerationprovidesrapid
output of PG jobdeck files that conform
to the specific requirements of
customer and mask maker
• Offerseasy-to-usegraphicuserinterfaces
• Automatesreticleframedesign
synthesis and associated wafer layout
• Automatesmulti-dieclusterbuilding
with optimizations for scribability
• Automatesthebuildingofmulti-
layer reticles
• Usesadrag-and-dropplacementmethod
for semi-automatic customization
• Supportsfracturepreparation
• Automatesthegenerationof
PG jobdecks
• Generatescustomizedpaperwork
• Acceptsandoutputsindustry-standard
formats
FEATURES
FRAME gENERATION AND
wAFER lAyOUT
• Supportformulti-dieclustering
• Supportformulti-layerreticles
• Testdieinsertion
• Handlesequipmentmixandmatch
• Flexiblescribesizing
• Variousalgorithmsforplacingin-
scribe structures
• Optionaldrag-and-dropmodeof
item placement
• AutomaticgenerationofIDlabels
and barcodes
• Automaticgenerationofedge-seals
• Automaticdie-sitenumbering
• Handlestechnologyshrinks
• Optimizationforbestlensusageand/or
wafer utilization
• Optionalinteractivemodefor
wafer layout
• Easyintegrationofcustomerprograms
Frame generation within the Cadence
MaskCompose environment is fast,
automatic, and repeatedly correct. With
requirements previously stored, the user
can select a desired stepper floorplan and
appropriate process technology via an
implementation module. After entering a
few simple pieces of information, the
program is executed and generates the
reticle design and associated wafer layout
in conformance with the requirements set
forth in the definition module.
Figure 2: Automatically generated reticle frame diagram